Faraday launches SONOS eFlash platform

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Faraday Technology, an ASIC design service and IP provider, has collaborated with Infineon to develop a SONOS eFlash platform on UMC’s 40uLP process.

The platform includes a newly developed eFlash subsystem IP and complete eFlash testing solution that comes with easy-to-integrate and fast data access features. This solution is intended to help customers accelerate product development and utilise the flash memory technology more easily. It also simplifies SONOS eFlash testing with a built-in self-test (BIST) function to provide customers solid quality advantages.

To meet the demand for 40nm low-power and secure eFlash driven by AI, smart grid, IoT, and MCU applications, Faraday and Infineon have jointly developed this SONOS eFlash platform which contains a flash memory block, controller and the new subsystem IP.

This subsystem includes bus interface, integrated clock control circuits and additional features, such as automatic eFlash initialisation, simplified erase/write procedure to offload CPU overhead, read/write protection, and a pseudo random write buffer, enabling IP integration and the utilisation of SONOS eFlash IP.

In addition, this subsystem with BIST enables the chips to be tested on general testing equipment to ensure the flash memory quality and reliability, as well for testing time reduction.

Commenting Vineet Agrawal, Sr. Director of Infineon Technologies LLC Memory Solutions, said, “The 40uLP SONOS eFlash has already delivered abundant mass-production projects within the last few years. With Faraday’s comprehensive SONOS eFlash IP subsystem, IP portfolio, and testing solutions, we believe this solution will facilitate Faraday’s customers to speed up the development of a wide range of high-performance and low-power products in the near future.”

“Infineon’s SONOS eFlash technology has been market-proven in various applications on 40nm process,” explained Flash Lin, COO of Faraday. “By leveraging the advantages of Infineon’s SONOS eFlash on UMC 40uLP, manufacturing cycle time can benefit from far fewer additional mask layers when compared to other eFlash solutions. Combining with the new platform and our comprehensive ready-to-use 40nm IP products, which are fully compatible with 40uLP SONOS eFlash process, we further help customers easily achieve cost, power, and performance requirements for their next-generation designs.”