Collaboration to address epitaxial wafer production challenges

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IQE has signed a collaboration agreement with Australian company BluGlass. Under the terms of the 15 month joint R&D agreement, the two companies will work together to develop technology for high quality III-N films deposited by Remote Plasma Chemical Vapour Deposition (RPCVD) on silicon and crystalline rare earth (cREO) on silicon templates.

Dr Rodney Pelzel, IQE’s vp of group technology, said: “We are extremely pleased to announce our collaboration with BluGlass. BluGlass’ RPCVD technology is complementary to IQE’s existing portfolio and the collaboration is a key step in overcoming challenges inherent to epitaxial growth of cutting edge materials.”

BluGlass has developed the RPCVD process as a way to grow materials such as gallium nitride and indium gallium nitride for use in devices including LEDs, power electronics and concentrated solar cells.

RPCVD technology is said to offer benefits over existing approaches, including higher efficiency, lower cost, substrate flexibility and greater scalability.

BluGlass’ managing director Giles Bourne said: “We have chosen to work with IQE based on the enormous market potential and impact that the applications that we will be co-developing could have on the semiconductor industry. IQE is committed to cutting edge innovation and its diverse product portfolio makes it a very compelling partner.”

According to Dr Pelzel, the agreement is a ‘key milestone’ for IQE. “This arrangement comes on the heels of our announcement earlier this year of successful transfer of cREO epi capability to IQE’s North Carolina manufacturing site. IQE remains committed to fully exploiting cREO technology for III-N, as well as other III-V and group IV materials. This collaborative arrangement is a key step in furthering this technology.”