IMEC builds 11Mpixel micro mirror array
IMEC has described at today’s International Electron Devices Meeting a monolithically integrated 11Mpixel micro mirror array which it claims represents the highest pixel density and reliability for such a device.
Each mirror in the array measures 8µm x 8µm and can be individually tilted by the high speed integrated cmos circuitry underneath the array.
According to IMEC, the array has an area of 10cm² and a pixel density double that of comparable micro mirrors. Applications for the device range from video projection to lithography.
The mirrors were fabricated on top of a foundry high voltage 0.18µm cmos process on 200mm wafers with six interconnect levels.
