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Rohm unveils 5th Gen P-channel MOSFETs

ROHM has released a 24-model lineup of -40V/-60V withstand voltage P-channel MOSFETs available in both single and dual configurations.

The growing demand for higher efficiency and power density is driving the adoption of higher input voltages in industrial and consumer applications, as a result, MOSFETs are expected to provide not only low ON resistance, but high withstand voltages as well.

Two types of MOSFETs exist: N-channel and P-channel. Although N-channel types generally feature higher efficiency when used in the high side, a gate voltage higher than the input voltage is needed, complicating circuit configuration. On the other hand, P-channel MOSFETs can be driven with a gate voltage lower than the input voltage, simplifying circuit configuration considerably while reducing design load.

In response, ROHM has developed low ON resistance -40V/-60V P-channel MOSFETs compatible with 24V input, utilizing advanced 5th gen refined process. Based on ROHM’s P-channel MOSFET structure, these new products leverage refined process technology to achieve the lowest ON resistance per unit area in their class. This translates to 62% lower ON resistance vs conventional products for -40V new products and 52% for the -60V new products.

Quality has also been improved by optimising the device structure and adopting a new design that mitigates electric field concentration. As a result, both high reliability and low ON resistance (which are typically in a trade-off relationship) are achieved. These solutions contribute to stable long-term operation in industrial equipment demanding exceptional quality.

ROHM continues to develop a variety of packages for a wide range of applications, including products optimised for the automotive sector. In addition to these 5th gen P-channel MOSFETs, to strengthen its lineup for 5G base stations and data center servers, where demand is growing, the company is also developing higher efficiency N-channel MOSFETs. These products contribute to reducing application design load while increasing higher efficiency and reliability.

Author
Neil Tyler

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