comment on this article

X-Fab announces first 200V SOI foundry technology

X-Fab announces first 200V SOI foundry technology

X-Fab has announced XT018, which it claims is the world's first trench dielectric isolated SOI foundry technology for 200V MOS capability at 180nm.

The company says that using the full dielectric isolation of this modular process allows blocks at different voltage levels to be integrated on a single chip instead of placed on different chips. This reduces the amount of additional components required on pcbs, eliminates latch up and provides built in robustness against electromagnetic interference.

"Our XT018 technology provides exceptional dielectrically isolated high voltage support," commented Sebastian Schmidt, product marketing manager for X-FAB's high voltage product line. "Such isolation makes it easier to design for short innovation cycles, is straightforward, and results in a faster time to market."

XT018 SOI technology is said to be the only foundry process available at 180nm for 100 to 200V applications. It is suitable for consumer, medical, telecommunication infrastructure and industrial applications that need bidirectional isolation.

The technology combines fully isolated MOS transistors for the high voltage drain with a 180nm technology for 1.8/5V I/O and up to six metal layers. It uses a super junction architecture with patented dielectric HV termination for the MOS transistors, allowing compact design with a Ron as low as 0.3Omm² for 100V and 1.1Omm² for 200V nMOS transistors.

The HV MOS transistors are designed to have identical electrical parameters for both low and high side operation.

Author
Simon Fogg

Comment on this article


This material is protected by Findlay Media copyright See Terms and Conditions. One-off usage is permitted but bulk copying is not. For multiple copies contact the sales team.

Enjoy this story? People who read this article also read...

What you think about this article:


Add your comments

Name
 
Email
 
Comments
 

Your comments/feedback may be edited prior to publishing. Not all entries will be published.
Please view our Terms and Conditions before leaving a comment.

Related Articles

NI Trend Watch 2014

This report from National Instruments summarises the latest trends in the ...

Multicore Challenge

Now in its fifth year, the Multicore Challenge conference embraces the ...

BEEAs 2013

The sixth British Engineering Excellence Awards (BEEAs) will be held on 9th ...

Terence Watson

Ask Terence Watson about power electronics and you're left in no doubt of his ...