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Cymer takes first order for 90W laser 10/07/2008
 
ArF laser, immersion lithography, double patterning Light source developer Cymer says a major scanner manufacturer has placed the first order for two XLR 600i light sources, 90W ArF lasers designed to enable immersion and double patterning lithography at the 32nm node and beyond.
“This milestone purchase – the industry’s first for a 90W system – affirms Cymer’s leadership in developing and commercialising technology that enables the highest performance at the lowest operating cost,” said Ed Brown, Cymer’s president and coo.
The XLR series boasts light pulses that are more than 50% longer than other excimer lasers, with lower energy density reducing peak pulse power and improving optics lifetime.
 
Author
Graham Pitcher
 
 
Supporting Information
 
 http://www.cymer.com
 
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