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Toshiba and NEC collaborate on 32nm
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27/11/2007
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Toshiba and NEC are collaborating on the development of 32nm system LSI process technology. The ‘significant development resources’ required mean the companies are working together to develop the process more efficiently, in turn allowing them to bring competitive products to market more quickly.
The two companies have been working together on 45nm process technology development since February 2006 at Toshiba’s Advanced Microelectronics Center in Yokohama. The new agreement extends work at the site to 32nm.
Meanwhile, Toshiba and NEC will discuss development of derivative and differentiated process technologies, as well as joint manufacturing operations, with a decision expected in 2008.
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Author
Graham Pitcher
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